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MGMT Orthopedic Implants
| Customization: | Available |
|---|---|
| After-sales Service: | Onlin |
| Warranty: | 1 |
Introduction: Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. It is widely used in fields of micro-electronics, nano-materials, optical films, solar batteries, etc.
Product Benefits:
Advanced software controlling system with integrated technological formulation, parameter setting, popedom setting, interlocking alarming, and state supervisory control.
ALD Films Capability:
Application Fields:
| Wafer Dimension | 8 inch and below |
| Wafer Temperature | RT-400ºC, Precision ±0.1ºC |
| Precursor Lines | Three precursor lines (Optional more) |
| Line/Source Temperature | RT-200ºC, Precision ±0.1ºC |
| ALD Valve | Swagelok ALD swift valve |
| Background Vacuum | <5*10-3 Torr |
| Gas Carrier System | N2 or Ar |
| Growing Mode | Consecutive or interval deposition mode |
| Controlling System | PLC plus touch screen or display |
| Deposition Heterogeneity | <±1% |
| Instrument Dimension | 600mm x 600mm x 1100mm |





